ASML Delivers First ‘High NA’ Lithography System to Intel

ASML Delivers First 'High NA' Lithography System to Intel
ASML Delivers First 'High NA' Lithography System to Intel

ASML, a Dutch semiconductor equipment manufacturer, states that it has delivered the first of its new “High NA” extreme ultraviolet lithography systems to Intel Corp.

ASML, a Dutch semiconductor equipment maker, announced on Thursday that the first of its new “High NA” extreme ultraviolet lithography systems has been delivered to Intel Corp.

The new machines, which will each cost more than $300 million, are anticipated to aid computer chip manufacturers in the production of smaller, faster semiconductors.

On the X social networking platform, ASML posted an image of one segment of the machine leaving its offices in Veldhoven, Netherlands, in a protective case with a red ribbon tied around it.

“We’re excited and proud to ship our first high-NA EUV system to Intel,” ASML said.

ASML dominates the market for lithography systems, which employ lasers to assist in the manufacture of chip circuits. The High NA machines, which will be larger than a truck when built, are being sent in 250 different crates, including 13 large containers. They will be employed in commercial chip fabrication beginning in 2026 or 2027.

In 2022, Intel ordered the first high-NA pilot machines. Other chipmakers that have placed orders for the machines include TSMC, Samsung, SK Hynix, and Micron.

On November 30, ASML told reporters that the business anticipated launching the first pilot tools by the end of the year.

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